KIWOMASK S 110 / KIWOMASK S 111 Colourless

KIWOMASK S 110 is a screenprintable, "liquid" protector for partial or full surface protection of sensitive surfaces against mechanical stress during further processing or transportation. Resistant to organic solvents, KIWOMASK S 110 is water-based and can be cleaned either with water or easily removed after drying as a film. KIWOMASK S 110 has a high solids content and high contrast colouring. It is also available in the colourless version as KIWOMASK S 111 Colourless.

 

Technical information:

KIWOMASK S 110 - DE

KIWOMASK S 110 - EN

Fact sheets:

KIWOMASK S 110 - DE

KIWOMASK S 110 - EN

 

 

KIWOMASK S 150

KIWOMASK S 150 is a screenprintable, "liquid" protector for partial or full surface protection of sensitive surfaces against mechanical stress during further processing or transportation. Resistant to organic solvents,

 

KIWOMASK S 150 is water-based and can be cleaned with either water or easily removed after drying as a film. The transparent blue colouration allows detection of over-printed designs. KIWOMASK S 150 is also suitable for the protection of plastic films, which are deep-drawn after the printing process.

 

Technical information:

KIWOMASK S 150 - DE

KIWOMASK S 150 - EN

Fact sheets:

KIWOMASK S 150 - DE

KIWOMASK S 150 - EN

 

 

KIWOMASK W 850 Etch

Screenprintable resist enabling sharp contour printing for the partial covering of glass (e.g. sputtering / partial mirroring). Due to its good resistance to various acids, it is also possible to use KIWOMASK W 850 as an etch and galvano resist. Good resistance against aqueous cleaning processes. Strip with a (3–5 %) natron or potash solution, organic solvents or ready-to-use PREGASOL R 800.

 

Technical information:

KIWOMASK W 850 Etch - DE

KIWOMASK W 850 Etch - EN

Fact sheets:

KIWOMASK W 850 Etch - DE

KIWOMASK W 850 Etch - EN

 

 

KIWOMASK W 855

Screenprintable etch resist. Resistant to acid etching baths. KIWOMASK W 855 is used for etching conducting tracks, or partial surface coating using plasma processes (sputtering). Due to its high mechanical resistance, KIWOMASK W 855 is especially suitable for applications in which the surface is mechanically cleaned with brushes, prior to the etching or plating process. Strip with a (3–5 %) soda, natron or potash solution, organic solvents or ready-to-use PREGASOL R 800.

 

Factsheet:

KIWOMASK W 855 - DE

KIWOMASK W 855 - EN

 

 

KIWOMASK W 128

"Liquid" protective film with high chemical and mechanical resistance. KIWOMASK W 128 is very resistant against mechanical strain and is used as temporary protection on scratch-sensitive surfaces (e.g. glass, metals and various plastics) before applying further processing steps (such as drilling, stamping or cutting).

 

Factsheets:

KIWOMASK W 128 - DE

KIWOMASK W 128 - EN

 

 

 

KIWOMASK W 120 / KIWOMASK W 122 Colourless

Easily removable, water-resistant "liquid" protective film for glass, plastics and many other substrates against mechanical stress. Apply by spraying, as well as by roller, curtain or dip coating.

KIWOMASK W 122 Colourless is the transparent and with a higher viscosity, this version of KIWOMASK W 120 has similar resistance and comparable properties. The higher viscosity makes it especially suitable for curtain or roller coating. The transparency which occurs after drying enables recognition of designs printed underneath.

 

Technical information:

KIWOMASK W 120 - DE

KIWOMASK W 120 - EN

Fact sheets:

KIWOMASK W 120 / W 122 Colourless - DE

KIWOMASK W 120 / W 122 Colourless - EN

 

 

KIWOMASK UV 871

UV curing resist for selective etching and brushing of metal surfaces, e.g. for the production of vehicle interior parts or industry signs. Besides very good mechanical resistance, KIWOMASK UV 871 is also resistant against acidic etching processes (e.g. ferric(III) chlorid). Excellent printing properties facilitate a sharp-edged print of finest structures. Cross linking by UV light provide short processing cycles without drying time. Aside from the common stripping methods with slightly alkaline stripping products, it can be removed with hot water (60 ° – 80 ° C / 140 ° – 175 ° F).

 

Fact sheets:

KIWOMASK UV 871 - DE

KIWOMASK UV 871 - EN

 

 

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